M. Walsh, K. Chau, S. Kirkpatrick, R. Svrluga, B. Piwczyk, F. Goodwin, D. Balachandran – “Mitigation of EUV mask blank substrate pit and scratch defects by Accelerated Neutral Atom Beam (ANAB) processing”, Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90480I (18 March 2014).
M. Walsh, K. Chau, S. Kirkpatrick, R. Svrluga – “Surface damage correction, and atomic level smoothing of optics by Accelerated Neutral Atom Beam (ANAB) Processing”, Proc. SPIE 9237, Laser-Induced Damage in Optical Materials: 2014, 92372I.
S. Kirkpatrick, M. Walsh, R. Svrluga, M. Thomas – “Improved laser damage threshold performance of calcium fluoride optical surfaces via Accelerated Neutral Atom Beam (ANAB) processing”, Proc. SPIE 9632, Laser-Induced Damage in Optical Materials: 2015, 96321Y.
Mariastefania De Vido, Michael J. Walsh, Sean Kirkpatrick, Richard Svrluga, Klaus Ertel, P. Jonathan Phillips, Paul D. Mason, Saumyabrata Banerjee, Jodie M. Smith, Thomas J. Butcher, Chris Edwards, Cristina Hernandez-Gomez, John L. Collier – “Impact of gas cluster ion and accelerated neutral atom beam surface treatments on the laser-induced damage threshold of ceramic Yb:YAG”, Optical Materials Express 7(9), 3303-3311 (2017).